Student Paper Award Announced!!

Session Index

Thin Film Technology and Optical Engineering

Oral session 2 - Optical Thin Film (II)
Thursday, Dec. 4, 2014  15:30-17:00
Chair: Cheng-Chung Lee,Yi-Jun Jen
Room: B21
15:30 - 16:00 Paper No.  2014-Thu-S1002-O003
Invited speaker
Cheng-Chung Lee
Progress in coatings for optics and photonics
Cheng-Chung Lee,

Coatings have been applied widely in optics and photonics. They not only improve the optical performance of high quality optical devices, but also are key parts in optical operations. The evolution of optical interference coatings from the theory, the design to the manufacture will be introduced. Some interesting but challenging topics for the future will also be discussed.

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16:00 - 16:15 Paper No.  2014-Thu-S1002-O004
Yung Hsiang Hsieh Award Candidate Influence of organo-silicon film composition for barrier films
Yung Hsiang Hsieh,

Deposite the orgnao-silicon film for barrier films by magnetron PECVD. Increase the HMDSO and oxygen flow to influence the composition of organo-silicon film. The composition of organo-silicon films dominated by Si(-O-)4 has best WVTR value is 0.139 g/m2/day

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16:15 - 16:30 Paper No.  2014-Thu-S1002-O009
Yu-Zhong Lin Award Candidate Using Hydrothermal Method to Grow High Conformity Sidewall ZnO Nanorods
Yu-Zhong Lin,Hao-Yu Wu,Yu-Wen Cheng,Ching-Fuh Lin,

High conformity sidewall ZnO nanorods are manufactured on etched Si by hydrothermal method. The morphology of ZnO nanorods is examined by scanning electron microscopy. Also, the results show that we successfully spin coat ZnO seed layer on the sidewalls of grooves. ZnO nanorods are grown in grooves of etched Si.

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16:30 - 16:45 Paper No.  2014-Thu-S1002-O010
Huang-Wei Pan Award Candidate Stress effect on mechanical loss of the SiNX film deposited with PECVD method on silicon cantilever
Huang-Wei Pan,

Stress of SiNx film can be adjusted easily by tuning the gas flow ratio of SiH4/NH3 in PECVD. In this paper, it is found that mechanical loss of SiNx film decreases as the stress increases. This exciting behavior describes that SiNx is a advantageous material for low mechanical loss coating.

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16:45 - 17:00 Paper No.  2014-Thu-S1002-O015
Gun-Han Lyu Negative index of a symmetrical metal-dielectric film stack
Gun-Han Lyu,Yi-Jun Jen,

A five-layered symmetrical film stack MDMDM that consists of a dielectric film D and a metal film M are analyzed using the film matrix method. The condition to have a negative refractive index is analyzed for three different wavelengths. It is demonstrated that the negative real equivalent refractive index exists over a wide angle range.

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